More products from ISTEQ:
TEUS - LPP EUV light source with high brightness and low debris
LPP EUV source is based on fast rotating liquid metal target. A novel LPP target with conventional debris mitigation techniques has resulted in an ultimate solution for a clean photon EUV source.
XWS-65 - laser pumped plasma ultrabright broadband light source
- Extra wide spectral range
- Ultra high brightness
- High stability
- Long lifetime
In XWS sources, plasma emits light due to the interaction between a continuous energy input from a laser and the gas medium used (optical discharge). These light sources have been developed as a replacement for traditional gas discharge lamps (Xenon, Deuterium, Tungsten, etc.) and LEDs. Compared to these, XWS sources have a wider spectral range and higher spectral brightness.